Three Dimensional Micro Fabrication of Photoresist and Resin Materials by Using Gray-scale Lithography and Molding-Reference-Cited by-同舟云学术

Three Dimensional Micro Fabrication of Photoresist and Resin Materials by Using Gray-scale Lithography and Molding

Published:2004 Issue:10 Volume:124 Page:359-363
ISSN:1341-8939
Container-title:IEEJ Transactions on Sensors and Micromachines
language:en
Short-container-title:IEEJ Trans. SM

Author:

Mori Ryotaro¹,Hanai Kei¹,Matsumoto Yoshinori¹

Affiliation:

1. Faculty of Science and Technology, Department of Applied Physics and Physico-Informatics, Keio University

Publisher

Institute of Electrical Engineers of Japan (IEE Japan)

Subject

Electrical and Electronic Engineering,Mechanical Engineering

Link

https://www.jstage.jst.go.jp/article/ieejsmas/124/10/124_10_359/_pdf

Reference9 articles.

1. (1) K. Reimer, U. Hofmann, M. Jürss, W. Pilz, H. J. Quenzer, and B. Wagner: “Fabrication of Microrelief Surfaces using a One-Step Lithography Process”, SPIE, Vol. 3226, pp. 2-10 (1997)

2. (2) H. P. Herzig: “MICRO-OPTICS”, Taylor & Francis, pp. 140-142 (1997)

3. (3) W. Däschner, P. Long, R. Stein, C. Wu, and S. H. Lee: “Cost-effective mass fabrication of multilevel diffractive optical elements by use of a single optical exposure with a gray-scale mask on high-energy beam-sensitive glass”, Appl. optics, Vol. 36, No. 20, pp. 4675-4680 (1997)

4. (4) R. Mori and Y. Matsumoto: “3-D Micro Machining of Photo Sensitive Glass Using Gray-Scale Mask”, T. IEE Japan, Vol. 123-E, No. 11, pp. 499-503 (2003-11) (in Japanese)

5. (5) K. Hanai and Y. Matsumoto: “A Study of Gray Scale Lithography with Micro Chrome Pattern”, T. IEE Japan, Vol. 123-E, No. 10, pp. 410-415 (2003-10) (in Japanese)

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