Fabrication and Application of Micro Tapered Structure by Proximity Backside Exposure-Reference-Cited by-同舟云学术

Fabrication and Application of Micro Tapered Structure by Proximity Backside Exposure

Published:2009 Issue:12 Volume:129 Page:480-485
ISSN:1341-8939
Container-title:IEEJ Transactions on Sensors and Micromachines
language:en
Short-container-title:IEEJ Trans. SM

Author:

Matsumoto Yoshinori¹,Makabe Keiji¹

Affiliation:

1. Faculty of Science and Technology, Department of Applied Physics and Physico-Informatics, Keio University

Publisher

Institute of Electrical Engineers of Japan (IEE Japan)

Subject

Electrical and Electronic Engineering,Mechanical Engineering

Link

http://www.jstage.jst.go.jp/article/ieejsmas/129/12/129_12_480/_pdf

Reference13 articles.

1. (1) MC. Peterman, P. Huie, DM. Bloom, and HA. Fishman : “Building thick photoresist structures from the bottom up”, J Micromech Microeng, Vol. 13, pp. 380-382 (2003)

2. (2) 庄子習一:「ポリマーを用いたMEMS技術とその応用」,電学論E,124, 10, pp. 349-353 (2004-10)

3. (3) I. Song, K. Kang, Y. Jin, D. S. Park, and P. K. Ajmera : “Microlens array fabrication by backside exposure using Fraunhofer diffraction”, J Micromech Microeng, Vol. 14, pp. 1285-1290 (2008)

4. (4) 花井計.清水さやか.松本佳宣:「バイナリオプティクスによるネガ型レジストの三次元形状」,電学論E, 125, 10, pp. 424-425 (2005-10)

5. (5) 花井計.中原崇.鈴木慎也.松本佳宣:「傾斜回転による三次元加工法」,電学論E, 126, 6, pp. 222-227 (2006-6)

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