Effects of Discharge-induced Disturbance on Spectral Characteristics of Highly Repetitive Excimer Laser-Reference-Cited by-同舟云学术

Effects of Discharge-induced Disturbance on Spectral Characteristics of Highly Repetitive Excimer Laser

Published:2010 Issue:6 Volume:130 Page:555-560
ISSN:0385-4205
Container-title:IEEJ Transactions on Fundamentals and Materials
language:en
Short-container-title:IEEJ Trans. FM

Author:

Saito Takashi¹²,Horioka Kazuhiko¹

Affiliation:

1. Department of Energy Sciences, Tokyo Institute of Technology

2. Gigaphoton Inc.

Publisher

Institute of Electrical Engineers of Japan (IEE Japan)

Subject

Electrical and Electronic Engineering

Link

http://www.jstage.jst.go.jp/article/ieejfms/130/6/130_6_555/_pdf

Reference8 articles.

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2. (2) H. Tsushima, M. Yoshino, T. Ohta, T. Kumazaki, H. Watanabe, S. Matsumoto, H. Nakarai, H. Umeda, Y. Kawasuji, T. Suzuki, S. Tanaka, A. Kurosu, T. Matsunaga, J. Fujimoto, and H. Mizoguchi : “Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography”, Proc. SPIE, Vol. 7274, pp. 72743L-1-10 (2009)

3. (3) H. Meiling, N. Buzing, K. Cummings, N. Harned, B. Hultermans, R. Jonge, B. Kessels, P. Kurz, S. Lok, M. Lowisch, J. Mallman, B. Pierson, C. Wagner, A. Dijk, E. Setten, and J. Zimmerman : “EUVL System — Moving Towards Production”, Proc. SPIE, Vol. 7271, pp. 727102-1-15 (2009)

4. (4) M. Burkhardt, J. Arnord, Z. Baum, S. Burns, J. Chang, J. Chen, J. Cho, V. Dai, Y. Deng, S. Han. S. Holmes, D. Horak, S. Kanakasabapathy, R. Kim, A. Klatchko, C. Koay, A. Kransnoperova, Y. Ma. E. McLellan, K. Petrillo, S. Schmitz, C. Tabery, Y. Yin, L. Zhuang, Y. Zou, J. Kye, V. Parruchuri, S. Mansfold, S. Sperience, and M. Colbum : “Overcoming the challenges of 22-nm node patterning through litho-design co-optimization”, Proc. SPIE, Vol. 7274, pp. 727404-1-8 (2009)

5. Feasibility study of 6 kHz ArF excimer laser for 193 nm immersion lithography