Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography-Reference-Cited by-同舟云学术

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Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography

Published:2009-03-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Tsushima Hiroaki,Yoshino Masaya,Ohta Takeshi,Kumazaki Takahito,Watanabe Hidenori,Matsumoto Shinichi,Nakarai Hiroaki,Umeda Hiroshi,Kawasuji Yasufumi,Suzuki Toru,Tanaka Satoshi,Kurosu Akihiko,Matsunaga Takashi,Fujimoto Junichi,Mizoguchi Hakaru

Publisher

SPIE

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Extremely long life excimer laser technology for multi-patterning lithography;Optical Microlithography XXXI;2018-03-20

3. Effects of Discharge-induced Disturbance on Spectral Characteristics of Highly Repetitive Excimer Laser;IEEJ Transactions on Fundamentals and Materials;2010

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