Additional Impurity Roles of Nitrogen and Carbon for Ternary compound W-C-N Diffusion Barrier for Cu interconnect-Reference-Cited by-同舟云学术

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Additional Impurity Roles of Nitrogen and Carbon for Ternary compound W-C-N Diffusion Barrier for Cu interconnect

Published:2007-09-30 Issue:5 Volume:16 Page:348-352
ISSN:1225-8822
Container-title:Journal of the Korean Vacuum Society
language:en
Short-container-title:Journal of the Korean Vacuum Society

Author:

Kim Soo-In,Lee Chang-Woo

Publisher

The Korean Vacuum Society

Subject

Electrical and Electronic Engineering,Physical and Theoretical Chemistry,Condensed Matter Physics,Materials Science (miscellaneous)

Link

http://ocean.kisti.re.kr/downfile/crosscheck/kvs/JAKO200735836562157.pdf

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The Defect Characterization of Luminescence Thin Film by the Positron Annihilation Spectroscopy;Journal of the Korean Vacuum Society;2013-09-30

2. Surface Physical Properties of W-N Nano Thin Films by Nanotribological Analysis;Journal of the Korean Vacuum Society;2011-11-30

3. Physical Property of W-C-N Diffusion Barrier through Stress-Strain curve;Journal of the Korean Vacuum Society;2011-07-30

4. Reliability Measurements and Thermal Stabilities of W-C-N Thin Films Using Nanoindenter;Journal of the Korean Vacuum Society;2011-05-30

5. The Characterization of Proton Irradiated BaSrFBr:Eu Film by the Coincidence Doppler Broadening Positron Annihilation Spectroscopy;Journal of the Korean Vacuum Society;2009-11-30

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