In situ monitoring for development of rectangular photoresist gratings on transparent substrates
Author:
Publisher
The Optical Society
Reference12 articles.
1. Fabrication of extreme-ultraviolet blazed gratings by use of direct argon-oxygen ion-beam etching through a rectangular photoresist mask
2. Fabrication Of Photoresist Masks For Submicrometer Surface Relief Gratings
3. In situ monitoring technique for fabrication of high-quality diffraction gratings
4. In situ end-point detection during development of submicrometer grating structures in photoresist
5. In-situ monitoring of submicron polysilicon linewidths using diffraction gratings
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. A new method for non-destructive measuring of grating parameters;Holography, Diffractive Optics, and Applications IX;2019-11-18
2. Duty cycle estimate of photoresist gratings via monitoring TM/TE diffraction efficiency ratio during development;Applied Optics;2016-10-14
3. Controlling the duty cycle of holographic crossed gratings by in situ endpoint detection during development;Applied Optics;2016-03-28
4. In situ estimate of duty cycle of surface-relief holographic gratings during development by measuring TM/TE diffraction efficiency ratio;SPIE Proceedings;2015-06-21
5. Time-and-frequency domains approach to data processing in multiwavelength optical scatterometry of dielectric gratings;Journal of the Optical Society of America A;2013-02-18
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3