Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imaging-Reference-Cited by-同舟云学术

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Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imaging

Published:2010-04-26 Issue:9 Volume:35 Page:1404
ISSN:0146-9592
Container-title:Optics Letters
language:en
Short-container-title:Opt. Lett.

Author:

Peng Bo,Wang Xiangzhao,Qiu Zicheng,Yuan Qiongyan,Cao Yuting

Funder

National Natural Science Foundation of China (NSFC)

International Cooperation Program Project of Shanghai Municipal Science and Technology Commission

Shanghai Rising-Star Program

Basic Research Program of Science and Technology Commission of Shanghai Municipality

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference9 articles.

1. Design and analysis of manufacturable alternating phase-shifting masks

2. Incorporating mask topography edge diffraction in photolithography simulations

3. Fast and accurate 3D mask model for full-chip OPC and verification

4. Detection of focus and spherical aberration by use of a phase grating

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1. Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image;Applied Optics;2016-04-13

2. Parity decomposition theory of full wavefront aberration measurement using the intensity differences of aerial images in microlithography;Applied Optics;2015-06-04

3. In situaberration measurement method using a phase-shift ring mask;Journal of Micro/Nanolithography, MEMS, and MOEMS;2014-11-13

4. Adaptive denoising method to improve aberration measurement performance;Optics Communications;2013-11

5. In situaberration measurement technique based on an aerial image with an optimized source;Optical Engineering;2013-06-11

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