Moiré interferometry with high alignment resolution in proximity lithographic process-Reference-Cited by-同舟云学术

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Moiré interferometry with high alignment resolution in proximity lithographic process

Published:2014-02-07 Issue:5 Volume:53 Page:951
ISSN:1559-128X
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Zhou Shaolin,Hu Song,Fu Yongqi,Xu Xiangmin,Yang Jun

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Reference28 articles.

1. Optical measurement of strain and stress;Iskander,2010

2. Computer-aided speckle interferometry using spectral amplitude fringes

3. Interferometric profiler for rough surfaces

4. Dispersive interferometric profilometer

5. Computerized interferometric surface measurements [Invited]

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3. Large range nano alignment for proximity lithography using complex grating;Optics & Laser Technology;2019-04

4. Computer-aided assembly of X-ray parabolic cylinder laterally graded multilayer reflector to collimate divergent beam in XRD;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2018-10

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