Moiré interferometry with high alignment resolution in proximity lithographic process

Author:

Zhou Shaolin,Hu Song,Fu Yongqi,Xu Xiangmin,Yang Jun

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. 光刻对准关键技术的发展与挑战;Acta Optica Sinica;2023

2. Low-Symmetry Nanophotonics;ACS Photonics;2022-01-06

3. Large range nano alignment for proximity lithography using complex grating;Optics & Laser Technology;2019-04

4. Computer-aided assembly of X-ray parabolic cylinder laterally graded multilayer reflector to collimate divergent beam in XRD;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2018-10

5. Deformation-phase measurement by digital speckle correlation method;Applied Physics B;2016-09-15

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