Aberration measurement of projection optics in lithographic tools based on two-beam interference theory
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Publisher
The Optical Society
Reference4 articles.
1. Impact of lens aberrations on optical lithography
2. Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask
3. Techniques for measuring aberrations in lenses used in photolithography with printed patterns
4. Aberration measurement from specific photolithographic images: a different approach
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