Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask
Author:
Publisher
The Optical Society
Reference9 articles.
1. Impact of lens aberrations on optical lithography
2. Impact of wavefront errors on low k1 processes at extremely high NA
3. Techniques for measuring aberrations in lenses used in photolithography with printed patterns
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1. Aberration analysis and compensate method of a BP neural network and sparrow search algorithm in deep ultraviolet lithography;Applied Optics;2022-07-07
2. Aberration optimization in an extreme ultraviolet lithography projector via a BP neural network and simulated annealing algorithm;Applied Optics;2021-02-08
3. Analysis and modulation of aberration in an extreme ultraviolet lithography projector via rigorous simulation and a back propagation neural network;Applied Optics;2020-08-06
4. A general method of designing phase-shifting algorithms for grating lateral shearing interferometry;Frontiers of Information Technology & Electronic Engineering;2018-06
5. Calibration Method to Eliminate Zeroth Order Effect in Lateral Shearing Interferometry;Photonic Sensors;2018-04-06
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