Author:
Fang Chao,Xiang Yang,Qi Keqi,Chen Dawei
Publisher
Springer Science and Business Media LLC
Subject
Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference16 articles.
1. Y. Q. Yu, Y. F. Zhang, Z. L. Ou, X. Chen, Q. D. Huang, and S. C. Ruan, “Simultaneous measurement of one dimensional bending and temperature based on Mach-Zehnder interferometer,” Photonic Sensors, 2015, 5(4): 376–384.
2. L. C. Zhang, X. K. Cai, and G. Shi, “Optical coatings for DUV lithography,” Chinese Optics, 2015, 8(2): 169–181.
3. S. T. Gao, D. C. Wu, and E. L. Miao, “Distortion correcting method when testing large-departure asphere,” Chinese Optics, 2017, 10(3): 383–390.
4. F. Wang, X. Z. Wang, M. Y. Ma, D. Q. Zhang, W. J. Shi, and J. M. Hu, “Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask,” Applied Optics, 2006, 45(2): 281–287.
5. F. Z. Dai, J. Li, X. Z. Wang, and Y. Bu, “Exact two-dimensional zonal wavefront reconstruction with high spatial resolution in lateral shearing interferometry,” Optics Communications, 2016, 367: 367–264.