Subject
Computer Vision and Pattern Recognition,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Cited by
16 articles.
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1. EUV光刻三维掩模成像研究进展;Laser & Optoelectronics Progress;2022
2. 先进计算光刻;Laser & Optoelectronics Progress;2022
3. 深紫外计算光刻技术研究;Laser & Optoelectronics Progress;2022
4. High performance analysis of layered nanolithography masks by a surface impedance generating operator;Journal of the Optical Society of America A;2017-03-08
5. Level-set-based inverse lithography for mask synthesis using the conjugate gradient and an optimal time step;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-07