High performance analysis of layered nanolithography masks by a surface impedance generating operator-Reference-Cited by-同舟云学术

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High performance analysis of layered nanolithography masks by a surface impedance generating operator

Published:2017-03-08 Issue:4 Volume:34 Page:464
ISSN:1084-7529
Container-title:Journal of the Optical Society of America A
language:en
Short-container-title:J. Opt. Soc. Am. A

Author:

Gholipour Alireza,Faraji-Dana Reza,Vandenbosch Guy A. E.

Funder

Shahid Beheshti University G. C

Iran National Science Foundation (INSF)

Publisher

The Optical Society

Subject

Computer Vision and Pattern Recognition,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference10 articles.

1. A Roadmap for Optical Lithography

2. Efficient representation of mask transmittance functions for vectorial lithography simulations

3. Resolution enhancement for advanced mask aligner lithography using phase-shifting photomasks

4. Robust and efficient inverse mask synthesis with basis function representation

5. Binary mask optimization for forward lithography based on the boundary layer model in coherent systems

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Design and analysis of optical sensors composed of large arrays of nanowires using the surface impedance generating operator (SIGO) method;IET Optoelectronics;2021-06-11

2. Analysis of optical nanostructures using the surface impedance generating operator;Journal of the Optical Society of America B;2020-01-14

3. Using the Surface Impedance Model to Analyze Plasmonic Modes of a Circular Single Wire at Terahertz and Optical Frequencies;2019 2nd West Asian Colloquium on Optical Wireless Communications (WACOWC);2019-04

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