Initial structure design of coaxial six–ten mirror central-obscured extreme ultraviolet lithographic objective
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering
Reference5 articles.
1. Reflective high-NA projection lenses
2. Design of multi-mirror optics for industrial extreme ultraviolet lithography
3. Grouping design of eight-mirror projection objective for high-numerical aperture EUV lithography
4. Mask effects for high-NA EUV: impact of NA, chief-ray-angle, and reduction ratio
5. LPP-EUV light source development for high volume manufacturing lithography
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1. Automatic design of an extreme ultraviolet lithography objective system based on the Seidel aberration theory;Applied Optics;2022-10-03
2. Design of an extreme ultraviolet lithography projection objective with a grouping design method through forward and reverse real ray tracing;Applied Optics;2022-08-25
3. Grouping design method dependence on an illumination system and large off-axis distance for an anamorphic extreme ultraviolet lithography objective;Applied Optics;2022-01-18
4. Design of Refractive/Diffractive Hybrid Projection Lens for DMD-Based Maskless Lithography;Optics;2021-06-08
5. Aspherical surfaces design for extreme ultraviolet lithographic objective with correction of thermal aberration;Optical Engineering;2016-09-29
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