Design of multi-mirror optics for industrial extreme ultraviolet lithography-Reference-Cited by-同舟云学术

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Design of multi-mirror optics for industrial extreme ultraviolet lithography

Published:2013-03 Issue:2 Volume:20 Page:120-126
ISSN:1340-6000
Container-title:Optical Review
language:en
Short-container-title:OPT REV

Author:

Liu Fei,Li Yanqiu

Publisher

Springer Science and Business Media LLC

Subject

Atomic and Molecular Physics, and Optics

Link

http://link.springer.com/content/pdf/10.1007/s10043-013-0017-2.pdf

Reference5 articles.

1. S. A. Lerner and J. M. Asian: Opt. Eng. 39 (2000) 792.

2. M. F. Bal: Dr. Thesis, Technique University Delft, Delft (2003).

3. O. E. Marines: Dr. Thesis, Delft, Technique University Delft, Delft (2006).

4. Wang Cheng: Dr. Thesis, University of Alabama, Birmingham (1992).

5. H. Kang, S. Hansen, and J. Schoot: Proc. SPIE 6921 (2008) 69213I.

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