Generation of trapezoidal illumination for the step-and-scan lithographic system-Reference-Cited by-同舟云学术

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Generation of trapezoidal illumination for the step-and-scan lithographic system

Published:2015-07-28 Issue:22 Volume:54 Page:6820
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Chen Ming,Chen Liqun,Zeng Aijun,Zhu Jing,Yang Baoxi,Huang Huijie

Funder

International Science and Technology Cooperation Programs of China

National Science and Technology Major Project of China

Science and Technology Commission of Shanghai Municipality

Publisher

The Optical Society

Reference11 articles.

1. Advanced mask aligner lithography: new illumination system

2. Statistic analysis of influence of phase distortion on diffractive optical element for beam smoothing

3. Optimization by Simulated Annealing

4. Quantized phase optimization of two-dimensional Fourier kinoforms by a genetic algorithm

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