Reflectometer-based metrology for high-aspect ratio via measurement
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference4 articles.
1. Valve cone measurement using white light interference microscopy in a spherical measurement geometry
2. Measurement of deep silicon trench profile using normal incidence optical CD metrology
3. Scatterometry for shallow trench isolation (STI) process metrology
4. UV-reflectometory for fast trench-depth measurement
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