Production of Brewster angle thin film polarizers using a ZrO_2/SiO_2 pair of materials-Reference-Cited by-同舟云学术

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Production of Brewster angle thin film polarizers using a ZrO_2/SiO_2 pair of materials

Published:2016-11-07 Issue:4 Volume:56 Page:C30
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Zhupanov V.,Kozlov I.,Fedoseev V.,Konotopov P.,Trubetskov M.,Tikhonravov A.

Funder

Russian Foundation for Basic Research (RFBR)

Deutsche Forschungsgemeinschaft (DFG)

Munich-Centre for Advanced Photonics (MAP)

Publisher

The Optical Society

Reference13 articles.

1. Brewster's angle thin film plate polarizer design study from an electric field perspective

2. Status of NIF mirror technologies for completion of the NIF facility

3. Thin-film polarizers for the OMEGA EP laser system

4. High damage threshold mirrors and polarizers in the ZrO2/SiO2 and HfO2/SiO2 dielectric systems

5. Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster's angle polarizers at 1064 nm

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