Condenser optics, partial coherence, and imaging for soft-x-ray projection lithography-Reference-Cited by-同舟云学术

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Condenser optics, partial coherence, and imaging for soft-x-ray projection lithography

Published:1993-12-01 Issue:34 Volume:32 Page:6938
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Sommargren Gary E.,Seppala Lynn G.

Publisher

The Optical Society

Reference8 articles.

1. Soft x-ray projection lithography using an x-ray reduction camera

2. Soft x-ray reduction lithography using multilayer mirrors

3. Short-wavelength annular-field optical system for imaging tenth-micron features

4. Multilayer mirror technology for soft-x-ray projection lithography

5. Reflective systems design study for soft x-ray projection lithography

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. 极紫外光刻机曝光系统光学设计研究与进展;Acta Optica Sinica;2023

2. Design of an illumination system for high numerical aperture anamorphic extreme ultraviolet projection lithography;Optics Express;2021-03-24

3. Correction of phase-shifting error in wavelength scanning digital holographic microscopy;Measurement Science and Technology;2018-03-26

4. Computational methods in vectorial imaging;Journal of Modern Optics;2011-03-10

5. SUB-100 nm LITHOGRAPHY WITH PATTERN AND PARTIAL COHERENCE CONTROL;International Journal of Nanoscience;2006-08

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