Intensity modulation based optical proximity optimization for the maskless lithography-Reference-Cited by-同舟云学术

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Intensity modulation based optical proximity optimization for the maskless lithography

Published:2020-01-02 Issue:1 Volume:28 Page:548
ISSN:1094-4087
Container-title:Optics Express
language:en
Short-container-title:Opt. Express

Author:

Liu Jianghui,Liu Junbo,Deng Qingyuan,Feng Jinhua,Zhou Shaolin^ORCID,Hu Song

Funder

National Natural Science Foundation of China

Sichuan Province Science and Technology Support Program

Pearl River S and T Nova Program of Guangzhou

South China University of Technology

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference21 articles.

1. High-speed spatial control of the intensity, phase and polarisation of vector beams using a digital micro-mirror device

2. Active illumination using a digital micromirror device for quantitative phase imaging

3. Tailoring light with a digital micromirror device

4. High-resolution maskless lithography

5. Maskless lithography

Cited by 19 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Deep learning-driven digital inverse lithography technology for DMD-based maskless projection lithography;Optics & Laser Technology;2025-01

2. Controllable Preparation of Fused Silica Micro Lens Array through Femtosecond Laser Penetration-Induced Modification Assisted Wet Etching;Materials;2024-08-27

3. Optimize projected mask images for improving three-dimensional printing accuracy for digital light processing based vat photopolymerization;Additive Manufacturing;2024-05

4. Mask-Moving-Lithography-Based High-Precision Surface Fabrication Method for Microlens Arrays;Micromachines;2024-02-19

5. Digital inverse patterning solutions for fabrication of high-fidelity microstructures in spatial light modulator (SLM)-based projection lithography;Optics Express;2024-02-12

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