Fullerene-assisted electron-beam lithography for pattern improvement and loss reduction in InP membrane waveguide devices-Reference-Cited by-同舟云学术

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Fullerene-assisted electron-beam lithography for pattern improvement and loss reduction in InP membrane waveguide devices

Published:2014-03-13 Issue:6 Volume:39 Page:1645
ISSN:0146-9592
Container-title:Optics Letters
language:en
Short-container-title:Opt. Lett.

Author:

Jiao Yuqing,Pello Josselin,Mejia Alonso Millan,Shen Longfei,Smalbrugge Barry,Geluk Erik Jan,Smit Meint,van der Tol Jos

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference10 articles.

1. On-Chip Optical Interconnect Roadmap: Challenges and Critical Directions

2. Photonic integration in indium-phosphide membranes on silicon

3. Hybrid Integrated Platforms for Silicon Photonics

4. Reinventing germanium avalanche photodetector for nanophotonic on-chip optical interconnects

5. Loss Reduction of Si Wire Waveguide Fabricated by Edge-Enhancement Writing for Electron Beam Lithography and Reactive Ion Etching Using Double Layered Resist Mask with C60

Cited by 25 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Precise and smooth structure on InP fabricated by femtosecond laser direct writing-assisted wet etching;Optics & Laser Technology;2024-09

2. Fullerene Nanostructure-Coated Channels Activated by Electron Beam Lithography for Resistance Switching;ACS Applied Nano Materials;2022-04-15

3. Mode division multiplexing: from photonic integration to optical fiber transmission [Invited];Chinese Optics Letters;2021

4. InP Membrane on Silicon (IMOS) Photonics;IEEE Journal of Quantum Electronics;2020-02

5. InP membrane integrated photonics research;Semiconductor Science and Technology;2020-01-01

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