Fullerene Nanostructure-Coated Channels Activated by Electron Beam Lithography for Resistance Switching-Reference-Cited by-同舟云学术

Fullerene Nanostructure-Coated Channels Activated by Electron Beam Lithography for Resistance Switching

Published:2022-04-15 Issue:5 Volume:5 Page:6430-6437
ISSN:2574-0970
Container-title:ACS Applied Nano Materials
language:en
Short-container-title:ACS Appl. Nano Mater.

Author:

Takeuchi Mihiro¹²^ORCID,Umeta Yukiya¹²^ORCID,Suga Hiroshi¹²^ORCID,Wakahara Takatsugu³^ORCID,Wang Ying-Chiao²^ORCID,Naitoh Yasuhisa⁴^ORCID,Wakabayashi Katsunori⁵^ORCID,Tsukagoshi Kazuhito¹²^ORCID

Affiliation:

1. Chiba Institute of Technology, Tsudanuma, Narashino, Chiba 275-0016, Japan

2. International Center for Materials Nanoarchitectonics (WPI-MANA), National Institute for Materials Science(NIMS), Tsukuba, Ibaraki 305-0044, Japan

3. Carbon Composite Materials Group, Research Center for Functional Materials, National Institute for Materials Science(NIMS), Tsukuba, Ibaraki 305-0044, Japan

4. National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8565, Japan

5. Department of Nanotechnology for Sustainable Energy, School of Science and Technology, Kwansei Gakuin University, Sanda, Hyogo 669-1337, Japan

Funder

Japan Society for the Promotion of Science

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsanm.2c00523

Reference63 articles.

1. C60: Buckminsterfullerene

2. Molecular structure of the C70 fullerene

3. Isolation and identification of fullerene family: C76, C78, C82, C84, C90 and C96

4. Production and isolation of an ellipsoidal C80 fullerene

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