Application of measurement configuration optimization for accurate metrology of sub-wavelength dimensions in multilayer gratings using optical scatterometry-Reference-Cited by-同舟云学术

Application of measurement configuration optimization for accurate metrology of sub-wavelength dimensions in multilayer gratings using optical scatterometry

Published:2016-08-23 Issue:25 Volume:55 Page:6844
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Zhu Jinlong,Shi Yating,Goddard Lynford L.,Liu Shiyuan

Funder

National Natural Science Foundation of China (NSFC)

Natural Science Foundation of Hubei Province of China

Program for Changjiang Scholars and Innovative Research Team in University of China

Gift Award from Cisco Systems Inc.

Publisher

The Optical Society

Reference35 articles.

1. Multiparameter grating metrology using optical scatterometry

2. Specular spectroscopic scatterometry

3. Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring

4. Scatterometry for in situ measurement of pattern reflow in nanoimprinted polymers

5. Device based in-chip critical dimension and overlay metrology

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optimizing measurement configuration for x-ray critical dimension metrology based on condition number;Fourteenth International Conference on Information Optics and Photonics (CIOP 2023);2023-11-24

2. Condition-number-based measurement configuration optimization for nanostructure reconstruction by optical scatterometry;Measurement Science and Technology;2023-08-10

3. Integrated optical critical dimension metrology with Mueller matrix ellipsometry;Thin Solid Films;2023-03

4. A combination of library search and Levenberg-Marquardt algorithm in optical scatterometry;Thin Solid Films;2023-02

5. 先进节点图案化晶圆缺陷检测技术;Laser & Optoelectronics Progress;2023