Error minimization method for spectroscopic and phase-modulated ellipsometric measurements on highly transparent thin films-Reference-Cited by-同舟云学术

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Error minimization method for spectroscopic and phase-modulated ellipsometric measurements on highly transparent thin films

Published:1993-04-01 Issue:4 Volume:10 Page:713
ISSN:1084-7529
Container-title:Journal of the Optical Society of America A
language:en
Short-container-title:J. Opt. Soc. Am. A

Author:

Campmany J.,Bertran E.,Canillas A.,Andújar J.L.,Costa J.

Publisher

The Optical Society

Subject

Computer Vision and Pattern Recognition,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference12 articles.

1. In situ optical characterizations for rf plasma deposited a-Si: H thin films

2. Insituspectroellipsometric study of the nucleation and growth of amorphous silicon

3. Influence of pressure and radio frequency power on deposition rate and structural properties of hydrogenated amorphous silicon thin films prepared by plasma deposition

4. Ellipsometric study ofa‐Si:H thin films deposited by square wave modulated rf glow discharge

5. A study of amorphous semiconductor interfaces by spectroscopic ellipsometry

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1. Errors in ellipsometry data fitting;Optics Communications;2018-11

2. Accurate analysis of ellipsometric data for thick transparent f ilms;Chinese Optics Letters;2011

3. Determination of optical constants of thin films and multilayer stacks by use of concurrent reflectance, transmittance, and ellipsometric measurements;Applied Optics;2001-10-01

4. Spectroscopic ellipsometric study of tetrahedral amorphous carbon films: optical properties and modelling;Diamond and Related Materials;2001-03

5. Effective dielectric function of mixtures of three or more materials: a numerical procedure for computations;Surface Science;2000-05

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