In situ optical characterizations for rf plasma deposited a-Si: H thin films
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference10 articles.
1. Fast polarization modulated ellipsometer using a microprocessor system for digital Fourier analysis
2. Influence of substrate structure on the growth of hydrogenated amorphous silicon studied byinsituellipsometry
3. Real time controlled rf reactor for deposition of a-Si:H thin films
4. Ellipsometry and Polarized Light;Azzam,1977
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