Design and fabrication of diffractive optical elements by use of gray-scale photolithography-Reference-Cited by-同舟云学术

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Design and fabrication of diffractive optical elements by use of gray-scale photolithography

Published:2005-02-01 Issue:4 Volume:44 Page:506
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Sohn Jin-Seung,Lee Myung-Bok,Kim Wan-Chin,Cho Eun-Hyung,Kim Tae-Wan,Yoon Chan-Young,Park No-Cheol,Park Young-Pil

Publisher

The Optical Society

Reference3 articles.

1. Cost-effective mass fabrication of multilevel diffractive optical elements by use of a single optical exposure with a gray-scale mask on high-energy beam-sensitive glass

2. An Ultraviolet-Curable Mold for Sub-100-nm Lithography

3. One-step 3D shaping using a gray-tone mask for optical and microelectronic applications

Cited by 26 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Realization of equivalent multi-level DOEs by the stack of two few-level DOEs using phase dividing;Optics Express;2024-08-06

2. A perspective on the artificial intelligence’s transformative role in advancing diffractive optics;iScience;2024-07

3. Exploring Diffractive Optical Elements and Their Potential in Free Space Optics and imaging‐ A Comprehensive Review;Laser & Photonics Reviews;2024-05-26

4. Photonic shaping tools for large-scale micro-machining;Laser-based Micro- and Nanoprocessing XVIII;2024-03-12

5. Direct Laser Writing of Diffractive Structures on Bi-Layer Si/Ti Films Coated on Fused Silica Substrates;Photonics;2023-07-04

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