Investigation of Film Thickness Uniformity on Substrates Located Close to the Source Axis

Author:

Bennett Jean M.,Ashley E. J.

Publisher

The Optical Society

Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. On evaporation via an inclined rotating circular lift-off shadow or stencil mask;Journal of Vacuum Science & Technology B;2019-01

2. Theoretical design of shadowing masks for uniform coatings on spherical substrates in planetary rotation systems;Optics Express;2012-10-02

3. Some Aspects of Simultaneous Evaporation Techniques;Optica Acta: International Journal of Optics;1985-05

4. Measurements of angular evaporation characteristics of sources;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1983-07

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