Simultaneous dual-wavelength digital holographic microscopy with compensation of chromatic aberration for accurate surface characterization
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering
Reference29 articles.
1. Steep large film thickness measurement with off-axis terahertz digital holography reconstructed by a direct Fourier and Hermite polynomial
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3. An automatic processing technique for accurate surface form measurement
4. Curvature measurement using phase shifting in-line interferometry, single shot off-axis geometry and Zernike's polynomial fitting
5. Fast phase-shifting technique for 3-D surface micro-topography measurement
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