Six-directional pseudorandom consecutive unicursal polishing path for suppressing mid-spatial frequency error and realizing consecutive uniform coverage-Reference-Cited by-同舟云学术

Six-directional pseudorandom consecutive unicursal polishing path for suppressing mid-spatial frequency error and realizing consecutive uniform coverage

Published:2019-10-31 Issue:31 Volume:58 Page:8529
ISSN:1559-128X
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Zhao Qizhi,Zhang Lei,Fan Cheng

Funder

Natural Science Foundation of the Jiangsu Higher Education Institutions of China

National Natural Science Foundation of China

China Postdoctoral Science Foundation

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Reference39 articles.

1. Computer-controlled chemical mechanical polishing of silicon modification layer on aspheric silicon carbide surface

2. Role of ionic strength in chemical mechanical polishing of silicon carbide using silica slurries

3. Study on chemical mechanical polishing of silicon wafer with megasonic vibration assisted

4. Magnetorheological finishing and subaperture stitching interferometry of large and lightweight optics

5. Viscoplastic flow in slightly varying channels with wall slip pertaining to a magnetorheological (MR) polishing process

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