Study on chemical mechanical polishing of silicon wafer with megasonic vibration assisted
Author:
Funder
LIAONING Science & Technology
Department of Education of Liaoning Province
Publisher
Elsevier BV
Subject
Acoustics and Ultrasonics
Reference20 articles.
1. Effects of pad properties on material removal in chemical mechanical polishing;Park;J. Mater. Process. Technol.,2007
2. Surface removal rate in chemical-mechanical polishing;Xun;Part. Sci. Technol.,2002
3. Chemical mechanical planarization from macro-scale to molecular scale;Wang;Mater. Manuf. Processes,2012
4. Chemical-mechanical planarization advances with the times;Vijayakumar;Potentials, IEEE,2008
Cited by 39 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Polishing-induced material attrition in surface-texturing AlN using a nanoscale polishing tool: An atomic-scale understanding;Tribology International;2024-04
2. Prediction of quadratic cylinder surface morphology for ultrasonic assisted polishing;Measurement;2024-02
3. Nontraditional energy-assisted mechanical machining of difficult-to-cut materials and components in aerospace community: a comparative analysis;International Journal of Extreme Manufacturing;2024-01-29
4. Atomistic analysis of the phase transformation and wear regimes of textured Wurtzite-SiC hexagonality using molecular dynamics simulation;Tribology International;2023-10
5. Chemical mechanical polishing of silicon carbide (SiC) based on coupling effect of ultrasonic vibration and catalysis;Journal of Environmental Chemical Engineering;2023-10
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3