Computer-controlled chemical mechanical polishing of silicon modification layer on aspheric silicon carbide surface-Reference-Cited by-同舟云学术

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Computer-controlled chemical mechanical polishing of silicon modification layer on aspheric silicon carbide surface

Published:2013 Issue:12 Volume:21 Page:3015-3020
ISSN:1004-924X
Container-title:Optics and Precision Engineering
language:en
Short-container-title:光学精密工程

Author:

ZHANG Feng 张峰

Publisher

Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences

Subject

Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Φ380 mm薄镜面预应力研磨及检测研究;Acta Optica Sinica;2021

2. Analysis of Removal Function Results of Permanent Magnet Polishing Device Test;IOP Conference Series: Materials Science and Engineering;2020-01-01

3. Six-directional pseudorandom consecutive unicursal polishing path for suppressing mid-spatial frequency error and realizing consecutive uniform coverage;Applied Optics;2019-10-31

4. Polishing path generation for physical uniform coverage of the aspheric surface based on the Archimedes spiral in bonnet polishing;Proceedings of the Institution of Mechanical Engineers, Part B: Journal of Engineering Manufacture;2019-03-26

5. Manufacturing and testing of surface modified silicon carbide aspheric mirror;9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes;2019-01-11

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