Thermal oxide patterning method for compensating coating stress in silicon substrates
Author:
Funder
Goddard Space Flight Center
National Aeronautics and Space Administration
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference19 articles.
1. Advanced X-Ray Astrophysics Facility (AXAF)
2. Toward large-area sub-arcsecond x-ray telescopes II
3. Manufacture of mirror glass substrates for the NuSTAR mission
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