Hydrogenated carbon films produced by sputtering in argon–hydrogen mixtures
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Publisher
The Optical Society
Reference5 articles.
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2. Plasma hydrogenated, reactively sputtered aluminium oxide for silicon surface passivation;physica status solidi (RRL) - Rapid Research Letters;2013-07-24
3. Isotopic 13C target foils 0.4–2.2mg/cm2 by pyrolysis of methane, with alternative methods of production;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2006-05
4. X-ray photoelectron spectroscopy studies of the effects of plasma etching on amorphous carbon nitride films;Applied Surface Science;2002-06
5. Influence of rf power on carbon nitride films prepared by rf magnetron sputtering;Fourth International Conference on Thin Film Physics and Applications;2000-11-29
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