Electromagnetic study of a photolithography setup for periodic masks and application to nonperiodic masks
Author:
Publisher
The Optical Society
Subject
Computer Vision and Pattern Recognition,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference7 articles.
1. Novel method to fabricate corrugation for a λ/4‐shifted distributed feedback laser using a grating photomask
2. Characterization of near-field holography grating masks for optoelectronics fabricated by electron beam lithography
3. Fused silica masks for printing uniform and phase adjusted gratings for distributed feedback lasers
4. Multilayer modal method for diffraction gratings of arbitrary profile, depth, and permittivity
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