Numerical study of photolithography system: electromagnetic differential method

Author:

Goumri-Said S.,Salomon L.,Dufour J.-P.,Aourag H.

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,Metals and Alloys,Computer Science Applications,Modeling and Simulation,Ceramics and Composites

Reference14 articles.

1. Efficient light scattering modeling for alignment, metrology, and resist exposure in photolithography;Yuan;IEEE Trans. Electron Dev.,1992

2. Photopolymer replication—a new techniques for 0/25μm phase shifted DFB-LD grating manufacteur?;Yeo;Proc. IEE,1993

3. P. Vincent, Differential methods, in: R. Petit (Ed.), Electromagnetic Theory of Gratings, Springer-Verlag, Berlin, 1980, pp. 101–121.

4. J.L. Roumiguière, M. Nevière, Procédé pour reporter sur un support l’ombre fidèle d’un masque percé de fentes distribuées périodiquement, et application de ce procédé notamment en photolithogravure, French patent 792,254 (1979).

5. B. Vidal, P. Vincent, P. Dhez, M. Nevière, Thin films and gratings: theories used to optimize the high reflectivity of mirrors and gratings for x-ray optics, in: G.F. Marshall (Ed.), Applications of Thin Film Multilayered Structures to Figured X-ray Optics, Proc. Soc. Photo-Opt. Instrum. Eng. 563 (1985) 142.

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