Analysis of the laser oxidation kinetics process of In-In_2O_3 MTMO photomasks by laser direct writing-Reference-Cited by-同舟云学术

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Analysis of the laser oxidation kinetics process of In-In_2O_3 MTMO photomasks by laser direct writing

Published:2015-10-22 Issue:22 Volume:23 Page:29193
ISSN:1094-4087
Container-title:Optics Express
language:en
Short-container-title:Opt. Express

Author:

Xia Feng,Zhang Xinzheng,Wang Meng,Liu Qian,Xu Jingjun

Funder

111 Project

International S&T cooperation program of China

National Basic Research Programs of China

National Natural Science Foundation of China (NSFC)

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference29 articles.

1. Creating direct-write gray-scale photomasks with bimetallic thin film thermal resists

2. Creating 3D structures with a direct-write grayscale photomask made from Sn/In bimetallic films

3. Creating precise 3D microstructures using laser direct-write bimetallic thermal resist grayscale photomasks

4. Real-time optical characterization of laser oxidation process in bimetallic direct write gray scale photomasks

5. Enhancing direct-write laser control techniques for bimetallic grayscale photomasks

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1. Anomalous refinement and uniformization of grains in metallic thin films;Nano Research;2023-07-25

2. Parametric analysis and a predictive model for color difference during laser-induced coloration on titanium;Optics Express;2022-08-29

3. Femtosecond Laser Fabrication of Noble Metal Plasma Nanostructures and Its Application-A Mini Review;Frontiers in Physics;2022-07-04

4. Simulation of the laser-induced oxidation process in fabricated Sn-MTMO grayscale photomasks;OSA Continuum;2020-12-24

5. Analysis of the resolution enhancement in laser-induced TiO2 nanostructured materials;Optical Materials Express;2020-12-14

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