Simulation of the laser-induced oxidation process in fabricated Sn-MTMO grayscale photomasks-Reference-Cited by-同舟云学术

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Simulation of the laser-induced oxidation process in fabricated Sn-MTMO grayscale photomasks

Published:2020-12-24 Issue:1 Volume:4 Page:65
ISSN:2578-7519
Container-title:OSA Continuum
language:en
Short-container-title:OSA Continuum

Author:

Xia Feng,Zhang Kun,Li Shixia,Yun Maojin,Kong Weijin,Zhang Xinzheng^ORCID,Liu Qian

Funder

Natural Science Foundation of Shandong Province

National Natural Science Foundation of China

China Postdoctoral Science Foundation

Publisher

The Optical Society

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. Grayscale photomask fabricated by laser direct writing in metallic nano-films

2. MTMO grayscale photomask

3. TiO_2 micro-devices fabricated by laser direct writing

4. Study on optical and electric properties of ultrafine-grained indium films

5. Micro-optical elements fabricated by metal-transparent-metallic-oxides grayscale photomasks

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