Analytical modeling and three-dimensional finite element simulation of line edge roughness in scatterometry-Reference-Cited by-同舟云学术

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Analytical modeling and three-dimensional finite element simulation of line edge roughness in scatterometry

Published:2012-09-11 Issue:27 Volume:51 Page:6457
ISSN:1559-128X
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Kato Akiko,Burger Sven,Scholze Frank

Funder

German Federal Ministry of Education and Research

EMRP

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Reference22 articles.

1. Effect of line and trench profile variation on specular and diffuse reflectance from a periodic structure

2. Modeling the effect of line profile variation on optical critical dimension metrology

3. Effect of mask-roughness on printed contact-size variation in extreme-ultraviolet lithography

4. Profile reconstruction in extreme ultraviolet (EUV) scatterometry: modeling and uncertainty estimates

5. Optical Fourier transform scatterometry for LER and LWR metrology

Cited by 27 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Investigation of stochastic roughness effects for nanoscale grating characterization with a stand-alone EUV spectrometer;Photomask Technology 2022;2022-12-01

2. Analysis of Line-Edge Roughness Using EUV Scatterometry;Nanomanufacturing and Metrology;2022-03-02

3. Synthetic Data in Quantitative Scanning Probe Microscopy;Nanomaterials;2021-07-02

4. Fast scatterometric measurement of periodic surface structures in plasma-etching processes;Measurement;2021-01

5. 3D modeling of coherence scanning interferometry on 2D surfaces using FEM;Optics Express;2020-12-16

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