Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography-Reference-Cited by-同舟云学术

Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography

Published:2018-12-12 Issue:26 Volume:26 Page:33718
ISSN:1094-4087
Container-title:Optics Express
language:en
Short-container-title:Opt. Express

Author:

Svechnikov M. V.,Chkhalo N. I.,Gusev S. A.,Nechay A. N.,Pariev D. E.,Pestov A. E.^ORCID,Polkovnikov V. N.,Tatarskiy D. A.,Salashchenko N. N.,Schäfers F.,Sertsu M. G.^ORCID,Sokolov A.,Vainer Y. A.,Zorina M. V.

Funder

Deutsche Forschungsgemeinschaft (DFG)

Russian Foundation for Basic Research (RFBR)

Russian Science Foundation (RSF)

State Project

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference31 articles.

1. Extreme ultraviolet lithography and three dimensional integrated circuit—A review

2. Relationship between an EUV source and the performance of an EUV lithographic system;Banine,2000

3. Molybdenum–strontium multilayer mirrors for the 8–12-nm extreme-ultraviolet wavelength region

4. Temperature-dependent nanocrystal formation inMo∕Simultilayers

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