Combination of reaction ion etching and dynamic chemical etching for improving laser damage resistance of fused silica optical surfaces-Reference-Cited by-同舟云学术

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Combination of reaction ion etching and dynamic chemical etching for improving laser damage resistance of fused silica optical surfaces

Published:2016-09-21 Issue:19 Volume:41 Page:4464
ISSN:0146-9592
Container-title:Optics Letters
language:en
Short-container-title:Opt. Lett.

Author:

Sun Laixi,Huang Jin,Liu Hongjie,Ye Xin,Wu Jingjun,Jiang Xiaodong,Yang Liming,Zheng Wanguo,Wu Weidong

Funder

Development Foundation of China Academy of Engineering Physics

Science and Technology on Plasma Physics Laboratory

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference22 articles.

1. Model laser damage precursors for high quality optical materials

2. Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces

3. Detection of subsurface trace impurity in polished fused silica with biological method

4. Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm

5. Combining wet etching and real-time damage event imaging to reveal the most dangerous laser damage initiator in fused silica

Cited by 27 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Improvement of Laser Damage Resistance of Fused Silica Using Oxygen-Aided Reactive Ion Etching;Photonics;2024-08-04

2. Depth localization of subsurface defects by optical dark-field confocal microscopy;Measurement Science and Technology;2024-07-15

3. Rapid Detection and Elimination of Subsurface Mechanical Damage for Improving Laser-Induced Damage Performance of Fused Silica;Coatings;2024-04-12

4. Laser damage properties of LiB₃O₅ crystal surface under UV laser irradiation;Optics Express;2023-08-29

5. Combination of scanning ion beam etching and dynamic chemical etching for improving laser damage resistance of fused silica optics;Optical Materials;2022-12

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