Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography-Reference-Cited by-同舟云学术

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Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography

Published:2003-02-10 Issue:5 Volume:42 Page:820
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Naulleau Patrick P.,Goldberg Kenneth A.,Batson Phil,Bokor Jeffrey,Denham Paul,Rekawa Senajith

Publisher

The Optical Society

Reference11 articles.

1. Extreme ultraviolet lithography

2. Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography

3. Interference between Wavefronts Rotated or Reversed with Respect to Each Other and its Relation to Spatial Coherence*,†

4. Coherence and Fluctuations in Light Beams

5. Illumination with a moving light source

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