Illumination control in lensless imaging for EUV mask inspection and review
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SPIE
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. 基于傅里叶合成技术的光刻照明系统研究;Chinese Journal of Lasers;2023
2. Robust and reliable actinic ptychographic imaging of highly periodic structures in EUV photomasks;Photomask Technology 2022;2022-12-01
3. Photon flux dependent image resolution of reflective ptychographic microscope for extreme ultraviolet actinic mask metrology;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-09-20
4. Actinic patterned mask imaging using extreme ultraviolet ptychography microscope with high harmonic generation source;Applied Physics Express;2022-06-17
5. Lensless EUV mask inspection for anamorphic patterns;Extreme Ultraviolet (EUV) Lithography XII;2021-03-12
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