Optical, structural, and mechanical properties of silicon oxynitride films prepared by pulsed magnetron sputtering
Author:
Funder
Ministry of Science and Technology, Taiwan (MOST)
Publisher
The Optical Society
Reference29 articles.
1. Optomechanical characterisation of compressively prestressed silicon oxynitride films deposited by plasma-enhanced chemical vapour deposition on silicon membranes
2. Study of the optical properties of SiOxNy thin films by effective medium theories
3. Silicon oxynitride gas barrier coatings on poly(ether sulfone) by plasma-enhanced chemical vapor deposition
4. Impact of PECVD SiON stoichiometry and post-annealing on the silicon surface passivation
5. Effect of PECVD silicon oxynitride film composition on the surface passivation of silicon wafers
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