Influence of coating thickness on laser-induced damage characteristics of anti-reflection coatings irradiated by 1064 nm nanosecond laser pulses-Reference-Cited by-同舟云学术

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Influence of coating thickness on laser-induced damage characteristics of anti-reflection coatings irradiated by 1064 nm nanosecond laser pulses

Published:2017-01-04 Issue:4 Volume:56 Page:C188
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Song Zhi,Cheng Xinbin,Ma Hongping,Zhang Jinlong,Ma Bin,Jiao Hongfei,Wang Zhanshan

Funder

National Natural Science Foundation of China (NSFC)

National Program on Key Research Project

National Key Scientific Instrument and Equipment Development Project

National Major Research Equipment Development Project

Publisher

The Optical Society

Reference20 articles.

1. Novel perfluorinated antireflective and protective coating for KDP and other optical materials

2. Mechanisms of laser-induced failure in antireflection-coated LiNbO_3 crystals

3. Laser-induced damage properties of antireflective porous glasses

4. Ultraviolet laser-induced damage on fused silica substrate and its sol-gel coating

5. Study for Improvement of Laser Induced Damage of 1064 nm AR Coatings in Nanosecond Pulse

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Enhanced antireflective and laser damage resistance of refractive-index gradient SiO₂ nanostructured films at 1064 nm;Polish Journal of Chemical Technology;2024-06-01

2. Facile Fabrication of Graded-Refractive-Index SiO₂ Antireflective Films with Enhanced Laser Damage Resistance;International Journal of Nanoscience;2023-12-27

3. Investigating the material properties of HfO2/SiO2-based anti-reflection coatings during 1064 nm laser-induced breakdown in air and vacuum conditions;Optics & Laser Technology;2023-01

4. Study of micron-scale defects in optical coatings for high-power lasers deposited by ion beam sputtering;PROC SPIE;2021

5. Influence of the surface and subsurface contaminants on laser-induced damage threshold of anti-reflection sub-wavelength structures working at 1064 nm;Optics & Laser Technology;2020-07

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