Phase-shifting masks for microlithography: automated design and mask requirements-Reference-Cited by-同舟云学术

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Phase-shifting masks for microlithography: automated design and mask requirements

Published:1994-09-01 Issue:9 Volume:11 Page:2438
ISSN:1084-7529
Container-title:Journal of the Optical Society of America A
language:en
Short-container-title:J. Opt. Soc. Am. A

Author:

Pati Y. C.,Kailath T.

Publisher

The Optical Society

Subject

Computer Vision and Pattern Recognition,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference12 articles.

1. Improving resolution in photolithography with a phase-shifting mask

2. Binary and phase shifting mask design for optical lithography

3. Image construction: optimum amplitude and phase masks in photolithography

4. An error measure for dose correction in e-beam nanolithography

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