Measured optical constants of copper from 10 nm to 35 nm
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference16 articles.
1. Low dielectric constant materials for microelectronics
2. Electrochemical materials and processes in Si integrated circuit technology
3. Formation of a Copper Oxide Layer as a Key Step in the Metallic Copper Deposition Mechanism
4. Effects of P on amorphous chemical vapor deposition Ru-P alloy films for Cu interconnect liner applications
5. Alloying of copper for use in microelectronic metallization
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