Effects of Cl2 plasma treatment on stability, wettability, and electrical properties of ITO for OLEDs-Reference-Cited by-同舟云学术

Effects of Cl2 plasma treatment on stability, wettability, and electrical properties of ITO for OLEDs

Published:2019-07 Issue: Volume:93 Page:51-57
ISSN:0925-3467
Container-title:Optical Materials
language:en
Short-container-title:Optical Materials

Author:

Jung Sun-Gyu,Choi Kyung Bok,Park Chan Hyuk,Shim Yong Sub,Park Cheol Hwee,Park Young Wook,Ju Byeong-Kwon

Funder

Industry Technology R&D program of MOTIE/KEIT

National Research Foundation of Korea(NRF)

Korea Government (MSIP)

Basic Science Research Program the National Research Foundation of Korea(NRF)

Ministry of Education

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials,Inorganic Chemistry,Organic Chemistry,Physical and Theoretical Chemistry,Spectroscopy

Reference27 articles.

1. Flexible OLED Displays Using Plastic Substrates

2. New Approach Toward Fast Response Light-Emitting Electrochemical Cells Based on Neutral Iridium Complexes via Cation Transport

3. White organic light-emitting diodes with fluorescent tube efficiency

4. Structures and properties of electron‐beam‐evaporated indium tin oxide films as studied by x‐ray photoelectron spectroscopy and work‐function measurements

5. Oxide Contacts in Organic Photovoltaics: Characterization and Control of Near-Surface Composition in Indium−Tin Oxide (ITO) Electrodes

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of oxygen plasma on ITO surface and OLED physical properties;Microelectronics Reliability;2023-05

2. Improved contact quality for silver-free silicon heterojunction solar cells by phosphoric acid treatment;Solar Energy;2023-03

3. Ion beam assisted electron beam vacuum deposition of antireflective SiO₂coating on MgAl₂O₄spinel;International Journal of Applied Ceramic Technology;2023-02-16

4. Electrosynthesis of poly (4-amino-3-nitrostyrene) film and its characterization;Journal of Applied Electrochemistry;2022-10-06

5. Etching characteristics and surface properties of fluorine-doped tin oxide thin films under CF4-based plasma treatment;Applied Physics A;2022-09-30