Etching characteristics and surface properties of fluorine-doped tin oxide thin films under CF4-based plasma treatment
Author:
Funder
Chung-Ang University
National Research Foundation (NRF) of Korea
Publisher
Springer Science and Business Media LLC
Subject
General Materials Science,General Chemistry
Link
https://link.springer.com/content/pdf/10.1007/s00339-022-06082-y.pdf
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