Chemical vapor deposition and characterization of hafnium oxide films-Reference-Cited by-同舟云学术

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Chemical vapor deposition and characterization of hafnium oxide films

Published:2008-02 Issue:2-3 Volume:69 Page:685-687
ISSN:0022-3697
Container-title:Journal of Physics and Chemistry of Solids
language:en
Short-container-title:Journal of Physics and Chemistry of Solids

Author:

Smirnova T.P.,Yakovkina L.V.,Kitchai V.N.,Kaichev V.V.,Shubin Yu.V.,Morozova N.B.,Zherikova K.V.

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Reference22 articles.

1. Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films

2. Atomic layer deposition of thin hafnium oxide films using a carbon free precursor

3. Chemical vapor deposition of HfO2 films on Si(100)

4. Chemical vapor deposition and characterization of HfO2 films from organo-hafnium compounds

5. Characterization of Hafnium Oxide Thin Films by Source Gas Pulse Introduced Metalorganic Chemical Vapor Deposition Using Amino-Family Hf Precursors

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5. Stable chemical enhancement of passivating nanolayer structures grown by atomic layer deposition on silicon;Nanoscale;2023

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