Stable chemical enhancement of passivating nanolayer structures grown by atomic layer deposition on silicon

Author:

Pain Sophie L.1ORCID,Khorani Edris1ORCID,Niewelt Tim123ORCID,Wratten Ailish1ORCID,Walker Marc4ORCID,Grant Nicholas E.1ORCID,Murphy John D.1ORCID

Affiliation:

1. School of Engineering, University of Warwick, Coventry, CV4 7AL UK

2. Fraunhofer Institute for Solar Energy Systems ISE, Heidenhofstraße 2, 79110 Freiburg, Germany

3. Chair for Photovoltaic Energy Conversion, Institute for Sustainable Systems Engineering, University of Freiburg, Emmy-Noether-Straße 2, 79110 Freiburg, Germany

4. Department of Physics, University of Warwick, Coventry, CV4 7AL UK

Abstract

Production of a temporally stable chemically enhanced ultra-thin HfO2 interlayer with excellent passivation for use in photovoltaic passivating contacts.

Funder

Engineering and Physical Sciences Research Council

Leverhulme Trust

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Reference78 articles.

1. M.Fischer , M.Woodhouse , S.Herritsch and J.Trube , International Technology Roadmap for Photovoltaic (ITRPV): 2021 Results , VDMA , Frankfurt, Germany , 2022

2. L. E.Black , in New perspectives on surface passivation: Understanding the Si-Al2O3 interface , Springer , 2016 , ch. 2.6, p. 27

3. Passivating contacts for crystalline silicon solar cells

4. B.Santos , Longi claims world's highest efficiency for p-type, indium-free HJT solar cells , https://www.pv-magazine.com/2022/12/22/longi-claims-worlds-highest-efficiency-for-p-type-indium-free-hjt-solar-cells/ , (accessed 16 March, 2023)

5. Carrier-selective contacts for Si solar cells

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